In front-end semiconductor manufacturing, ESA (electrostatic attraction), ESD (electrostatic discharge) and ESD-induced EMI (electromagnetic interference) are persistent threats to cleanroom compliance, yield and tool uptime.
ESA causes particles to cling to charged surfaces, contaminating wafers, masks, and components. ESD can damage sensitive devices while the ESD-induced EMI disrupts automated tools and inspection systems—leading to downtime and process instability.
Controlling these electrostatic charge is essential for maintaining ISO 14644-1 cleanroom standards, reducing defects, and ensuring process reliability across critical processes like lithography, cleaning, wafer handling and transportation. In today’s ultra-clean, precision-driven fabs, preventing contamination through static control is not an optional. It’s critical!