In front-end semiconductor manufacturing, ESD (electrostatic discharge), ESA (electrostatic attraction), and EMI (electromagnetic interference) are persistent threats to yield, tool uptime, and cleanroom compliance.
ESA causes particles to cling to charged surfaces, contaminating wafers, masks, and optical components. ESD can damage sensitive devices, while EMI disrupts automated tools and inspection systems—leading to downtime and process instability.
Controlling these electrostatic forces is essential for maintaining ISO 14644 cleanroom standards, reducing defects, and ensuring process reliability across critical operations like lithography, wafer handling, and etch. In today’s ultra-clean, precision-driven fabs, preventing contamination through static control is not optional—it’s critical.